Patterned magnetic permalloy films: fabrication by e-beam and x-ray lithographic techniques
Academic Article
Publication Date:
2002
abstract:
Electron beam (e-beam) and X-ray lithographic techniques have been used to fabricate permalloy (Ni80Fe20) and nickel
rectangular and triangular dots and antidots on an area of (1 1)mm2. Dot dimensions and spacings range from 500 nm to
1m and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been
studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS)
technique.
rectangular and triangular dots and antidots on an area of (1 1)mm2. Dot dimensions and spacings range from 500 nm to
1m and from 250 nm to 50 nm, respectively. The changes of the magnetic properties induced by patterning have been
studied by means of magneto-optic Kerr effect (MOKE) magnetometry and the Brillouin light scattering (BLS)
technique.
Iris type:
01.01 Articolo in rivista
Keywords:
e-beam and X-ray lithographies; chemical amplified resists; magneto-optic Kerr effect magnetometry; Brillouin light scattering
List of contributors:
Gubbiotti, Gianluca
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