Patterning-Induced Strain Relief in Single Lithographic SiGe Nanostructures Studied by Nanobeam X-ray Diffraction

Academic Article
Publication Date:
2012
Iris type:
01.01 Articolo in rivista
List of contributors:
Authors of the University:
Handle:
https://iris.cnr.it/handle/20.500.14243/848
Published in:
NANOTECHNOLOGY (BRISTOL, ONLINE)
Journal