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Background gas density and beam losses in NIO1 beam source

Articolo
Data di Pubblicazione:
2016
Abstract:
NIO1 (Negative Ion Optimization 1) is a versatile ion source designed to study the physics of production and acceleration of H- beams up to 60 keV. In ion sources, the gas is steadily injected in the plasma source to sustain the discharge, while high vacuum is maintained by a dedicated pumping system located in the vessel. In this paper, the three dimensional gas flow in NIO1 is studied in the molecular flow regime by the Avocado code. The analysis of the gas density profile along the accelerator considers the influence of effective gas temperature in the source, of the gas temperature accommodation by collisions at walls, and of the gas particle mass. The calculated source and vessel pressures are compared with experimental measurements in NIO1 during steady gas injection.
Tipologia CRIS:
01.01 Articolo in rivista
Keywords:
Flow of gases; Gases; Ion sources; Negative ions; Background gas; Beam sources; Gas injection; Gas particles; Gas temperature; Molecular flow; Pumping systems; Vessel pressure; Density of gases; avocado; gas flow; injection
Elenco autori:
Serianni, Gianluigi
Autori di Ateneo:
SERIANNI GIANLUIGI
Link alla scheda completa:
https://iris.cnr.it/handle/20.500.14243/309525
Pubblicato in:
REVIEW OF SCIENTIFIC INSTRUMENTS ONLINE
Journal
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URL

http://scitation.aip.org/content/aip/journal/rsi/87/2/10.1063/1.4932976
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